Gudeng Equipment Co., LTD.

Research Gudeng Equipment Co., LTD. (6953.TWO) on Bullrun: market cap TWD 7.14B, P/E 24.6, dividend yield 2.9%. Explore financials, valuation history, model signals, and stock context.

Key Metrics

Valuation Snapshot

latest market cap is TWD 7.14B; P/E is 24.6; dividend yield is 2.9%.

Peer valuation comparison

Latest P/E is 24.59x versus a Technology sector median of 23.76x (3.5% above).

Latest dividend yield is 2.87% versus a Technology sector median of 2.17% (32.3% above).

Valuation history

YearSnapshot dateMarket capP/EDividend yieldAnnual dividend/share
20262026-10-18TWD 7.14B24.62.5%6

Dividend history

Latest trailing dividend snapshot: annual dividend/share 6 TWD, yield 2.9%.

About Gudeng Equipment Co., LTD.

Gudeng Equipment Co., LTD., together with its subsidiary, ShoWa Precision Co., Ltd., focuses on sales, repair and maintenance of various precision instruments. The company provides EUV reticle handling solutions, including automatic EIP inspection equipment/EUV reticle sidewall inspection, EUV lite exchanger, EUV reticle exchanger, and EUV vacuum cleaner; reticle solutions comprising reticle cleaner, large-size reticle cleaner, reticle exchanger, reticle cabinet solution, and reticle storage solution;

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Frequently asked questions

What is Gudeng Equipment Co., LTD.'s market cap?

Gudeng Equipment Co., LTD.'s market capitalization is TWD 7.14B.

What is Gudeng Equipment Co., LTD.'s P/E ratio?

Gudeng Equipment Co., LTD.'s price-to-earnings (P/E) ratio is 24.6.

Does Gudeng Equipment Co., LTD. pay a dividend?

Gudeng Equipment Co., LTD. has a dividend yield of 2.9%.

What does Gudeng Equipment Co., LTD. do?

Gudeng Equipment Co., LTD., together with its subsidiary, ShoWa Precision Co., Ltd., focuses on sales, repair and maintenance of various precision instruments. The company provides EUV reticle handling solutions, including automatic EIP inspection equipment/EUV reticle sidewall inspection, EUV lite exchanger, EUV reticle exchanger, and EUV vacuum cleaner; reticle solutions comprising reticle cleaner, large-size reticle cleaner, reticle exchanger, reticle cabinet solution, and reticle storage solution; and physical vapor deposition technology.